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Professional interests/researches:
• Design and fabrication of ion-beam and plasma devices for thin film deposition: sputtering ion sources, sources for ion-assisted deposition, magnetron sputtering systems.
• Investigation and development of ion-beam and plasma deposition processes for thin films formation: ion beam sputtering, dual ion-beam deposition, ion-assisted deposition, reactive magnetron sputtering, unbalanced magnetron sputtering, pulsed and RF magnetron sputtering.

Education
• 2002 - PhD degree, thesis on "The integrated ion plasma processes of thin film structures formation on complicated - relief surfaces" (Major "Technologies and equipment to fabricate semiconductors, electronic materials and devices"), BSUIR, Belarus.
• 1992 - Higher education degree, qualification of Design Engineer & Technologist of Radioelectronic Equipment, Minsk Radioengineering Institute (renamed into BSUIR in 1993), Belarus.

Working career:
The beginning of scientific work activity at the age of 25. Currently, the head of the Center 9.1. "Electronic Technologies and engineering diagnostics of process media and solid-state structures" of the R&Department of BSUIR.

Taught academic subjects:
• Integrated automated technological complexes.
• Plasma and beam technologies.

Main publications
More than 120 scientific publications, including seven scientific monographs, 50+ papers in international journals and conferences, six patents.